JPH0334050B2 - - Google Patents

Info

Publication number
JPH0334050B2
JPH0334050B2 JP57113147A JP11314782A JPH0334050B2 JP H0334050 B2 JPH0334050 B2 JP H0334050B2 JP 57113147 A JP57113147 A JP 57113147A JP 11314782 A JP11314782 A JP 11314782A JP H0334050 B2 JPH0334050 B2 JP H0334050B2
Authority
JP
Japan
Prior art keywords
thin film
metal thin
substrate
glass substrate
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57113147A
Other languages
English (en)
Japanese (ja)
Other versions
JPS593437A (ja
Inventor
Noboru Fukui
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP57113147A priority Critical patent/JPS593437A/ja
Publication of JPS593437A publication Critical patent/JPS593437A/ja
Publication of JPH0334050B2 publication Critical patent/JPH0334050B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP57113147A 1982-06-30 1982-06-30 半導体装置製造用基板 Granted JPS593437A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57113147A JPS593437A (ja) 1982-06-30 1982-06-30 半導体装置製造用基板

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57113147A JPS593437A (ja) 1982-06-30 1982-06-30 半導体装置製造用基板

Publications (2)

Publication Number Publication Date
JPS593437A JPS593437A (ja) 1984-01-10
JPH0334050B2 true JPH0334050B2 (en]) 1991-05-21

Family

ID=14604753

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57113147A Granted JPS593437A (ja) 1982-06-30 1982-06-30 半導体装置製造用基板

Country Status (1)

Country Link
JP (1) JPS593437A (en])

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03110438U (en]) * 1990-02-28 1991-11-13
JPH08149644A (ja) * 1994-11-22 1996-06-07 Kyoei Fuensu Kogyo Kk 高圧送電鉄塔取付用表示板
WO2004051369A1 (ja) * 2002-12-03 2004-06-17 Hoya Corporation フォトマスクブランク、及びフォトマスク
JP2005210093A (ja) * 2003-12-25 2005-08-04 Hoya Corp 多層反射膜付き基板、露光用反射型マスクブランクス及び露光用反射型マスク、並びにそれらの製造方法
US20050238922A1 (en) * 2003-12-25 2005-10-27 Hoya Corporation Substrate with a multilayer reflection film, reflection type mask blank for exposure, reflection type mask for exposure and methods of manufacturing them
JP6428400B2 (ja) 2015-03-13 2018-11-28 信越化学工業株式会社 マスクブランクス及びその製造方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4111154Y1 (en]) * 1964-06-05 1966-05-25
JPS5891450A (ja) * 1981-11-27 1983-05-31 Nec Kyushu Ltd フオトマスク

Also Published As

Publication number Publication date
JPS593437A (ja) 1984-01-10

Similar Documents

Publication Publication Date Title
JPH04129267A (ja) 半導体基板およびその製造方法
JPH0334050B2 (en])
JPS5851412B2 (ja) 半導体装置の微細加工方法
JPH0590391A (ja) 金属パタン形成用蒸着装置及び蒸着方法
KR20080028305A (ko) 포토마스크 블랭크, 포토마스크 블랭크의 제조 방법,포토마스크, 포토마스크의 제조 방법, 포토마스크 중간체및 패턴의 전사 방법
JPS60195546A (ja) マスク用基板
JPH07240360A (ja) 薬液塗布装置
JPS5444474A (en) Contact forming method of semiconductor device
GB2148539A (en) Lithographic mask
JPH05107745A (ja) フオトマスク及び半導体装置の製造方法
JPS6235361A (ja) フオトマスク材料
JPH0232526A (ja) 基板周縁露光装置
JPS60161767A (ja) 自動回転塗布機
JPH04324445A (ja) 露光用マスクおよびその製造方法
JPS5833253A (ja) 露光用マスク
JPS6022352Y2 (ja) 過密着防止用マスク
JPH05289313A (ja) ガラスマスク
JPS6338231A (ja) レジストマスクの形成方法
JPS6319321Y2 (en])
JPH04342256A (ja) フォトマスク
JPH02170163A (ja) 除共域を有するレジスト塗布基板およびその塗布方法
JPS6370524A (ja) レジスト塗布方法
JPS60235422A (ja) マスクパタ−ンの欠陥修正方法
JPH02181754A (ja) フォトマスク
JPH02161433A (ja) フォトマスク基板